MaskClean 150

Eco-Snow®'s advanced, automated MaskClean 150 System is a dry CO2 alternative to conventional cleaning methods for removing particulate and light organic contamination from the surface of photomask substrates. Clean-up after AFM mask repair operations is completely dry and residue free. The system's innovative CO2 precision surface processing technology offers numerous advantages: no drying time, low consumables cost, substrate temperature control, variable process definition, a small footprint, and eliminates the use and disposal of hazardous materials.